Development of a process model for CO2 laser mitigation of damage growth in fused silica

Michael D. Feit; Alexander M. Rubenchik; Charles D. Boley; Mark D. Rotter

doi:10.1117/12.523867

10 June 2004 Development of a process model for CO₂ laser mitigation of damage growth in fused silica

Michael D. Feit, Alexander M. Rubenchik, Charles D. Boley, Mark D. Rotter

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Proceedings Volume 5273, Laser-Induced Damage in Optical Materials: 2003; (2004) https://doi.org/10.1117/12.523867
Event: XXXV Annual Symposium on Optical Materials for High Power Lasers: Boulder Damage Symposium, 2003, Boulder, Colorado, United States

Abstract

A numerical model of CO₂ laser mitigation of damage growth in fused silica has been constructed that accounts for laser energy absorption, heat conduction, radiation transport, evaporation of fused silica and thermally induced stresses. This model will be used to understand scaling issues and effects of pulse and beam shapes on material removal, temperatures reached and stresses generated. Initial calculations show good agreement of simulated and measured material removal. The model has also been applied to LG-770 glass as a prototype red blocker material.

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Michael D. Feit, Alexander M. Rubenchik, Charles D. Boley, and Mark D. Rotter "Development of a process model for CO₂ laser mitigation of damage growth in fused silica", Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); https://doi.org/10.1117/12.523867

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