Localized silica re-fusion for laser damage mitigation

Philippe R. Bouchut; Laurence Delrive; Daniel Decruppe; Pierre Garrec

doi:10.1117/12.521861

10 June 2004 Localized silica re-fusion for laser damage mitigation

Philippe R. Bouchut, Laurence Delrive, Daniel Decruppe, Pierre Garrec

Author Affiliations +

Proceedings Volume 5273, Laser-Induced Damage in Optical Materials: 2003; (2004) https://doi.org/10.1117/12.521861
Event: XXXV Annual Symposium on Optical Materials for High Power Lasers: Boulder Damage Symposium, 2003, Boulder, Colorado, United States

Abstract

A continuous CO₂ laser is used to locally re-fuse silica and avoid growth of 3ω laser damaged sites. Temperature evolution on each spot is monitored by a radiometry diagnostic. Important temperature variations are observed from site to site at a mm scale. Such variations can only be induced by a non homogeneous, high temperature, thermal conductivity. Real time retroaction, on silica exposure to laser radiation, enables us to control surface silica evaporation and etching depth. The 3ω laser induced damage threshold test of the re-fused sites shows that the limit for the mitigation rate lies in the surrounding silica surface.

Citation Download Citation

Philippe R. Bouchut, Laurence Delrive, Daniel Decruppe, and Pierre Garrec "Localized silica re-fusion for laser damage mitigation", Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); https://doi.org/10.1117/12.521861

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