Photothermal multi-pixel imaging microscope

Christopher J. Stolz; Diane J. Chinn; Robert D. Huber; Carolyn L. Weinzapfel; Zhouling Wu

doi:10.1117/12.523669

10 June 2004 Photothermal multipixel imaging microscope

Christopher J. Stolz, Diane J. Chinn, Robert D. Huber, Carolyn L. Weinzapfel, Zhouling Wu

Author Affiliations +

Proceedings Volume 5273, Laser-Induced Damage in Optical Materials: 2003; (2004) https://doi.org/10.1117/12.523669
Event: XXXV Annual Symposium on Optical Materials for High Power Lasers: Boulder Damage Symposium, 2003, Boulder, Colorado, United States

Abstract

Photothermal microscopy is a useful nondestructive tool for the identification of fluence-limiting defects in optical coatings. Traditional photothermal microscopes are single-pixel detection devices. Samples are scanned under the microscope to generate a defect map. For high-resolution images, scan times can be quite long (1 mm² per hour). Single-pixel detection has geen used traditionally because of the ease in separating the laser-induced topographical change due to defect absorption from the defect surface topography. This is accomplished by using standard chopper and lock-in amplifier techniques to remove the DC signal. Multi-pixel photothermal microscopy is now possible by utilizing an optical lock-in technique. This eliminates the lock-in amplifier and enables the use of a CCD camera with an optical lock in for each pixel. With this technique, the data acquisition speed can be increased by orders of magnitude depending on laser power, beam size, and pixel density.

Citation Download Citation

Christopher J. Stolz, Diane J. Chinn, Robert D. Huber, Carolyn L. Weinzapfel, and Zhouling Wu "Photothermal multipixel imaging microscope", Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); https://doi.org/10.1117/12.523669

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