Single-shot and multishot laser-induced damage of HfO2/SiO2 multilayer at YAG third harmonic

Yuanan Zhao; Zhaosheng Tang; Jianda Shao; Zhengxiu Fan

doi:10.1117/12.522783

10 June 2004 Single-shot and multishot laser-induced damage of HfO₂/SiO₂ multilayer at YAG third harmonic

Yuanan Zhao, Zhaosheng Tang, Jianda Shao, Zhengxiu Fan

Proceedings Volume 5273, Laser-Induced Damage in Optical Materials: 2003; (2004) https://doi.org/10.1117/12.522783
Event: XXXV Annual Symposium on Optical Materials for High Power Lasers: Boulder Damage Symposium, 2003, Boulder, Colorado, United States

Abstract

HfO₂/SiO₂ dielectric mirrors for 355 nm, prepared by conventional electron beam deposition, had been investigated with respect to their laser damage resistance. Two kinds of HfO₂ with different purity were chosen as the high index material, whose impurity contents were evaluated by Glow Discharge Mass Spectrometer (GDMS) and X-ray Photoelectron Spectroscopy (XPS). Laser damage testing was performed both in the “1-on-1” and the “s-on-1” regime, using 355 nm pulsed laser with a pulse width of 8 ns. It was found that the laser induced damage threshold (LIDT) for single-shot was much higher than that for multishot. A phenomenon displayed that the impurity of zirconium was a critical hindrance in improving the LIDT in the single-shot process, but such an effect was not shown in the multishot process. The damage mechanism is different in the two manner of radiation, the main cause of the damage in single-shot is impurity absorption and that in the multishot is accumulation of structural defects. Optical microscopy and surface profiler was employed in mapping laser-induced damage morphology features after irradiation.

Citation Download Citation

Yuanan Zhao, Zhaosheng Tang, Jianda Shao, and Zhengxiu Fan "Single-shot and multishot laser-induced damage of HfO₂/SiO₂ multilayer at YAG third harmonic", Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); https://doi.org/10.1117/12.522783

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