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30 December 2003 Simulations and experiments on the fabrication of silicon tip
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Proceedings Volume 5342, Micromachining and Microfabrication Process Technology IX; (2003) https://doi.org/10.1117/12.524647
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States
Abstract
Simulations and experiments on three kinds of Si tip fabrication techniques had been done, which are Anisotropic Dry Etching (ADE) , Anisotropic Wet Etching (AWE) and AWE combining with bonding. The simulation results showed that the parameters applied in the ADE and AWE should be controlled much more precisely than AWE combining with bonding to get expected tips. The exp eriments prove that the parameters of fabricating silicon tip by ADE and AWE have little tolerance. The conclusions on AWE combining with bonding drew from simulations are verified in the detail experiments. From the simulations and experiments, excellent reliability and controllability are witnessed in AWE combining with bonding and a tip with top diameter within 23.44nm had been achieved.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mingliang Wang, Daoheng Sun, and Yanhua Wang "Simulations and experiments on the fabrication of silicon tip", Proc. SPIE 5342, Micromachining and Microfabrication Process Technology IX, (30 December 2003); https://doi.org/10.1117/12.524647
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