Design of continuous full-complex modulation proximity printing masks using a quadratic phase distribution

Luiz Goncalves Neto; Giuseppe Antonio Cirino; Ronaldo Domingues Mansano; Patrick Verdonck; Antonio Carlos Seabra

doi:10.1117/12.524564

29 December 2003 Design of continuous full-complex modulation proximity printing masks using a quadratic phase distribution

Luiz Goncalves Neto, Giuseppe Antonio Cirino, Ronaldo Domingues Mansano, Patrick Verdonck, Antonio Carlos Seabra

Author Affiliations +

Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.524564
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

In this work we propose the use of a quadratic phase distribution to implement continuous, full complex amplitude modulation proximity printing masks. The mask is calculated based on the inverse light propagation, determining values of both continuous phase and amplitude modulation. The novelty in this proposition is the use of a quadratic phase distribution in the desired reconstruction pattern in order to achieve a smooth phase and amplitude modulation during the mask calculation. The use of a quadratic phase distribution on the desired reconstruction pattern allows to spread the light of this pattern over a wide region of the calculated proximity-printing mask, generating a magnification of the information to be modulated by the mask. As a consequence, the feature sizes on the mask are larger than in the image reconstruction plane. We believe that this approach will allow the generation of a continuous variation of light in the final required pattern, allowing the generation of arbitrary 3D structures. The smooth phase and amplitude modulation distributions can also minimize the errors caused by using the scalar diffraction to calculate and encode the phase and amplitude modulation of the final mask.

Citation Download Citation

Luiz Goncalves Neto, Giuseppe Antonio Cirino, Ronaldo Domingues Mansano, Patrick Verdonck, and Antonio Carlos Seabra "Design of continuous full-complex modulation proximity printing masks using a quadratic phase distribution", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); https://doi.org/10.1117/12.524564

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KEYWORDS

Phase shift keying

Photomasks

Amplitude modulation

Modulation

Printing

Geometrical optics

Silica

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