Fabrication of three-dimensional photonic crystals using lithographic processes

Dennis W. Prather; Yao Peng; Garrett J. Schneider; Janusz Murakowski

doi:10.1117/12.538388

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29 December 2003 Fabrication of three-dimensional photonic crystals using lithographic processes

Dennis W. Prather, Yao Peng, Garrett J. Schneider, Janusz Murakowski

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Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.538388
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

In this paper we present lithographic-based fabrication methods for the realization of three-dimensional photonic crystals (PhCs). These methods are based on novel implementations of single and multi-step UV lithography. To this end, we begin by presenting a technique based on a multi-step process that allows for the stacking of planar photonic lattice layers that when repeated in the vertical direction serves to construct a three-dimensional PhC lattice. This process offers the unique ability to implement arbitrary defects, which thereby enables resonant cavities and embedded PhC waveguides. In addition, we also present a process based on three-dimensional interference lithography, which enables the realization of 3D photonic crystal lattices in a single lithographic step. Details of these processes and preliminary experimental results are presented.

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Dennis W. Prather, Yao Peng, Garrett J. Schneider, and Janusz Murakowski "Fabrication of three-dimensional photonic crystals using lithographic processes", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); https://doi.org/10.1117/12.538388

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