High-sensitivity material systems for two-photon three dimensional microfabrication

Stephen M. Kuebler; Joseph W. Perry; Seth R. Marder; Christopher Kemper Ober; Kevin L. Braun; Tianyue Yu; Wenhui Zhou

doi:10.1117/12.532614

29 December 2003 High-sensitivity material systems for two-photon three dimensional microfabrication

Stephen M. Kuebler, Joseph W. Perry, Seth R. Marder, Christopher Kemper Ober, Kevin L. Braun, Tianyue Yu, Wenhui Zhou

Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.532614
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

A photoacid generator (PAG) is described that can be efficiently activated by two-photon excitation and can be used for high-sensitivity three-dimensional micro-patterning of acid-sensitive media. The molecule has been specifically engineered to have both a large peak two-photon absorption cross section (δ = 690 x 10^-50 cm⁴ s photon^-1 at 705 nm) and a high quantum yield for the photochemical generation of acid (φ_H+ ≈ 0.5). Under near-infrared laser irradiation, the PAG produces acid subsequent to two-photon excitation and initiates the polymerization of epoxides. The PAG was used in conjunction with the epoxide resist SU-8 for negative-tone three-dimensional microfabrication and was incorporated into a specially formulated chemically amplified resist for positive-tone fabrication of a three-dimensional grating structure. These material systems expand the potential of three-dimensional microfabrication as a tool for manufacturing micro-electromechanical systems, micro-fluidics, and micro-optical structures.

Citation Download Citation

Stephen M. Kuebler, Joseph W. Perry, Seth R. Marder, Christopher Kemper Ober, Kevin L. Braun, Tianyue Yu, and Wenhui Zhou "High-sensitivity material systems for two-photon three dimensional microfabrication", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); https://doi.org/10.1117/12.532614

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