Si3N4-based photonic crystal membranes

Samir Ilias; Bruno Bourliguet; Claude Pare; Alex Paquet; Christine Alain; Hubert Jerominek

doi:10.1117/12.530314

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29 December 2003 Si₃N₄-based photonic crystal membranes

Samir Ilias, Bruno Bourliguet, Claude Pare, Alex Paquet, Christine Alain, Hubert Jerominek

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Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.530314
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

We describe the fabrication process of silicon nitride (Si₃N₄) based two-dimensional photonic crystals. The fabrication process mainly involves e-beam direct-write lithography and reactive ion etching. The concerned photonic crystal structures consist of a periodic arrangement of sub-micrometric holes transferred into a suspended Si₃N₄ membrane using a poly-methylmethacrylate resist layer as a mask. Numerical simulations based on a plane wave expansion method for 2D photonic band gap approximation were conducted to determine the design parameters of the photonic crystal membranes. Flat and stress free photonic crystal membranes were achieved with very good control in sidewall profile and feature shape.

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Samir Ilias, Bruno Bourliguet, Claude Pare, Alex Paquet, Christine Alain, and Hubert Jerominek "Si₃N₄-based photonic crystal membranes", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); https://doi.org/10.1117/12.530314

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