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18 June 2004 Fabrication of high-resolution gratings for polymeric optical waveguide devices
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High resolution gratings for the application of optical waveguide devices are fabricated using a series of photopolymers. The relief gratings were formed by the two-beam interference ablation technique using a third-harmonic generation of a Nd:YAG laser (355nm) onto polyimide and electrooptic polymer films. In polyimide films, the gratings with a period of 400nm and a depth of about 280nm were fabricated by the single-pulse irradiation. We tried to fabricate the gratings using a photoresist accompanied with wet development using an Ar+ laser (488nm). By wet development process, higher aspect and clearer periodical structure at a depth of 320nm and a period of nearly 500nm was realized. High diffraction efficiency of 55.4% was measured from the relief grating. We also replicated the grating to UV curable epoxy resin as an embossing master for the fabrication of waveguide devices.
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Shinya Shibata, Okihiro Sugihara, Toshikuni Kaino, and Naomichi Okamoto "Fabrication of high-resolution gratings for polymeric optical waveguide devices", Proc. SPIE 5351, Organic Photonic Materials and Devices VI, (18 June 2004);

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