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14 June 2004 Metal-oxide lift-off for optimized heterointegration of photonic circuits
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Abstract
Crystal ion slicing can fabricate microns-thin-films from bulk, single-crystal metal oxides, which are important materials in optical, microwave, and electrical applications. These thin-films maintain single-crystal properties, which are very difficult to achieve in other thin-film technologies such as epitaxial growth. In this paper, ion-slicing technique is reviewed briefly from a process, material, and device perspective. The demonstrated applications in integrated optics are listed, along with a complete reference to ion-slicing related publications.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tomoyuki Izuhara, Ryan Roth, Djordje Djukic, Antonije M. Radojevic, Richard M. Osgood Jr., Sasha Bakhru, and Hassaram Bakhru "Metal-oxide lift-off for optimized heterointegration of photonic circuits", Proc. SPIE 5356, Optoelectronic Integrated Circuits VI, (14 June 2004); https://doi.org/10.1117/12.537850
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