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A review of the current literature on plasma etching of ZnO is presented. The etch rates as a function of etch conditions in Cl2-based BCl3-based and CH4-based and related chemistries are reviewed. Resultant surface morphology, anisotropy, surface stoichiometry and band edge photoluminescence results are also discussed.
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Karen J. Nordheden, "Plasma etching of ZnO: a review," Proc. SPIE 5359, Quantum Sensing and Nanophotonic Devices, (6 July 2004); https://doi.org/10.1117/12.531391