X-Ray Lithography At The Stanford Synchrotron Radiation Laboratory (SSRL)

P. Pianetta; R. Redaelli; R. Jaeger; T. W. Barbee Jr.

doi:10.1117/12.947487

20 June 1985 X-Ray Lithography At The Stanford Synchrotron Radiation Laboratory (SSRL)

P. Pianetta, R. Redaelli, R. Jaeger, T. W. Barbee Jr.

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947487
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

A dedicated X-ray lithography system has been developed on Beam Line III-4 at the Stanford Synchrotron Radiation Laboratory (SSRL). The research program at SSRL includes studies of the spectral sensitivity of X-ray resists, mask characterization, and the applications of novel X-ray optics. The facilities available for this work and recent results in these areas will be described.

Citation Download Citation

P. Pianetta, R. Redaelli, R. Jaeger, and T. W. Barbee Jr. "X-Ray Lithography At The Stanford Synchrotron Radiation Laboratory (SSRL)", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947487

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