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20 June 1985 X-Ray Lithography At The Stanford Synchrotron Radiation Laboratory (SSRL)
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Abstract
A dedicated X-ray lithography system has been developed on Beam Line III-4 at the Stanford Synchrotron Radiation Laboratory (SSRL). The research program at SSRL includes studies of the spectral sensitivity of X-ray resists, mask characterization, and the applications of novel X-ray optics. The facilities available for this work and recent results in these areas will be described.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Pianetta, R. Redaelli, R. Jaeger, and T. W. Barbee Jr. "X-Ray Lithography At The Stanford Synchrotron Radiation Laboratory (SSRL)", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947487
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