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20 May 2004 Current status of Nanonex nanoimprint solutions
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Abstract
Nanoimprint lithography (NIL) has the advantage of high-throughput, sub-10 nm resolution and low cost [1]. It has been included into 2003 ITRS as the Next Generation Lithography (NGL) for 45 nm node [2]. This paper summarized current status of Nanonex imprint technologies. Nanonex imprint process includes thermal nanoimprint (T-NIL) and photo-curable nanoimprint (P-NIL). Both T-NIL and P-NIL utilized a proprietary air cushion press (ACP), which has the advantage of ultra-uniformity, low lateral stress, less damage to the mold and substrate, and higher alignment accuracy. Nanonex Corporation delivers user-friendly nanoimprint lithography tools and solutions for both experts and non-experts of micro and nanofabrication. Nanoimprint machines, resists, molds and processes have been developed and are available today.
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Hua Tan, Linshu Kong, Mingtao Li, Colby Steere, and Larry Koecher "Current status of Nanonex nanoimprint solutions", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.537241
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