Development of magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography

Bruno S. Bauer; Roberto C. Mancini; Volodymyr Makhin; Ioana Paraschiv; Andrey Esaulov; Radu Presura; Irvin R. Lindemuth; Peter T. Sheehey; Bryan J. Rice

doi:10.1117/12.536289

20 May 2004 Development of magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography

Bruno S. Bauer, Roberto C. Mancini, Volodymyr Makhin, Ioana Paraschiv, Andrey Esaulov, Radu Presura, Irvin R. Lindemuth, Peter T. Sheehey, Bryan J. Rice

Author Affiliations +

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.536289
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

A magnetohydrodynamic (MHD) model of gas discharges has been developed to accelerate the development of compact, intense sources of EUV radiation for microlithography. The model is an MHD numerical simulation with atomic and radiation physics. The plasma evolution is simulated with the MHRDR (Magneto-Hydro-Radiative-Dynamic-Research) 2D, three-temperature, MHD computer code. The MHD results are postrocessed witha code that caluculated the radiation spectrum from Xe ions, including 13.4-nm EUV output, based on a detailed collisional-radiative atomic kinetics model. A variety of gas discharges relevant to microlithography can be modeled with this new tool.

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Bruno S. Bauer, Roberto C. Mancini, Volodymyr Makhin, Ioana Paraschiv, Andrey Esaulov, Radu Presura, Irvin R. Lindemuth, Peter T. Sheehey, and Bryan J. Rice "Development of magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.536289

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