Estimation of emission efficiency for laser-produced EUV plasmas

Toru Kawamura; Atsushi Sunahara; Kouhei Gamada; Kazumi Fujima; Fumihiro Koike; Hiroyuki Furukawa; Takeshi Nishikawa; Akira Sasaki; Takashi Kagawa; Richard More; Takako Kato; Masakatsu Murakami; Vasillii Zhakhovskii; Hajime Tanuma; Takashi Fujimoto; Yoshinori Shimada; Michiteru Yamaura; Kazuhisa Hashimoto; Shigeaki Uchida; Chiyoe Yamanaka; Tomoharu Okuno; Takahiro Hibino; Nobuyoshi Ueda; Ryoji Matsui; Yezheng Tao; Mitsuo Nakai; Keisuke Shigemori; Shinsuke Fujioka; Keiji Nagai; Takayoshi Norimatsu; Hiroaki Nishimura; Katsunobu Nishihara; Noriaki Miyanaga; Yasukazu Izawa

doi:10.1117/12.535031

20 May 2004 Estimation of emission efficiency for laser-produced EUV plasmas

Toru Kawamura, Atsushi Sunahara, Kouhei Gamada, Kazumi Fujima, Fumihiro Koike, Hiroyuki Furukawa, Takeshi Nishikawa, Akira Sasaki, Takashi Kagawa, Richard More, Takako Kato, Masakatsu Murakami, Vasillii Zhakhovskii, Hajime Tanuma, Takashi Fujimoto, Yoshinori Shimada, Michiteru Yamaura, Kazuhisa Hashimoto, Shigeaki Uchida, Chiyoe Yamanaka, Tomoharu Okuno, Takahiro Hibino, Nobuyoshi Ueda, Ryoji Matsui, Yezheng Tao, Mitsuo Nakai, Keisuke Shigemori, Shinsuke Fujioka, Keiji Nagai, Takayoshi Norimatsu, Hiroaki Nishimura, Katsunobu Nishihara, Noriaki Miyanaga, Yasukazu Izawa

Author Affiliations +

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.535031
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Extreme Ultra Violet (EUV) light source produced by laser irradiation emits not only the desired EUV light of 13 ~ 14 nm (about 90 eV) but also shorter x-rays. For example, emissions around 4 ~ 8 nm (about 150 ~ 300 eV) and 1 ~ 2.5 nm (about 0.5 ~ 1.2 keV) are experimentally observed from Sn and/or SnO₂ plasmas. These emissions are correspond to the N-shell and M-shell transitions, respectively. From the view point of energy balance and efficiency, these transitions should be suppressed. However, they may, to some extent, contribute to provide the 5p and 4f levels with electrons which eventually emit the EUV light and enhance the intensity. To know well about radiative properties and kinematic of the whole plasma, atomic population kinetics and spectral synthesis codes have been developed. These codes can estimate the atomic population with nl-scheme and spectral shapes of the EUV light. Radiation hydrodynamic simulation have been proceeding in this analysis. Finally, the laser intensity dependence of the conversion efficiency calculated by these codes agrees with that of the corresponding experimental results.

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Toru Kawamura, Atsushi Sunahara, Kouhei Gamada, Kazumi Fujima, Fumihiro Koike, Hiroyuki Furukawa, Takeshi Nishikawa, Akira Sasaki, Takashi Kagawa, Richard More, Takako Kato, Masakatsu Murakami, Vasillii Zhakhovskii, Hajime Tanuma, Takashi Fujimoto, Yoshinori Shimada, Michiteru Yamaura, Kazuhisa Hashimoto, Shigeaki Uchida, Chiyoe Yamanaka, Tomoharu Okuno, Takahiro Hibino, Nobuyoshi Ueda, Ryoji Matsui, Yezheng Tao, Mitsuo Nakai, Keisuke Shigemori, Shinsuke Fujioka, Keiji Nagai, Takayoshi Norimatsu, Hiroaki Nishimura, Katsunobu Nishihara, Noriaki Miyanaga, and Yasukazu Izawa "Estimation of emission efficiency for laser-produced EUV plasmas", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.535031

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