Layout decompression chip for maskless lithography

Borivoje Nikolic; Ben Wild; Vito Dai; Yashesh A. Shroff; Benjamin Warlick; Avideh Zakhor; William G. Oldham

doi:10.1117/12.535878

20 May 2004 Layout decompression chip for maskless lithography

Borivoje Nikolic, Ben Wild, Vito Dai, Yashesh A. Shroff, Benjamin Warlick, Avideh Zakhor, William G. Oldham

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.535878
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Future maskless lithography systems require data throughputs of the order of tens of terabits per second in order to have comparable performance to today’s mask-based lithography systems. This work presents an approach to overcome the throughput problem by compressing the layout data and decompressing it on the chip that interfaces to the writers. To achieve the required throughput, many decompression paths have to operate in parallel. The concept is demonstrated by designing an interface chip for layout decompression, consisting of a Huffman decoder and a Lempel-Ziv systolic decompressor. The 5.5mm x 2.5mm prototype chip, implemented in a 0.18μm, 1.8V CMOS process is fully functional at 100MHz dissipating 30mW per decompression row. By scaling the chip size up and implementing it in a 65nm technology, the decompressed data throughput required for writing 60 wafers per hour in 45nm technology is feasible.

Citation Download Citation

Borivoje Nikolic, Ben Wild, Vito Dai, Yashesh A. Shroff, Benjamin Warlick, Avideh Zakhor, and William G. Oldham "Layout decompression chip for maskless lithography", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.535878

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