Validation of lithography based on the controlled movement of light-emitting particles

Benjamin Yong Park; Rabih Zaouk; Marc Madou

doi:10.1117/12.534355

20 May 2004 Validation of lithography based on the controlled movement of light-emitting particles

Benjamin Yong Park, Rabih Zaouk, Marc Madou

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.534355
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

A novel particle-based lithography is proposed. In this approach a particle moving in a liquid in contact with a light-sensitive substrate creates traces on that substrate (for example on a photoresist or on a photographic film). The light-emitting particle causes photochemical/photoelectric changes in the light-sensitive substrate, creating a latent image. A group of these particles can be used to write many features on the same substrate in a parallel manner. We investigate the use of electrokinetic forces to move the particles over the light-sensitive substrate. We also report on the use of high-aspect-ratio carbon MEMS (C-MEMS) electrodes as 3D dielectrophoretic traps for the light-emitting particles and investigate the feasibility of using these carbon electrodes to manipulate the light-emitting particles to trace sub-micron patterns on a light-sensitive surface. We propose two types of particle-based lithography schemes and discuss applicable scaling laws. Feasibility experiments were carried out using microscale devices.

Citation Download Citation

Benjamin Yong Park, Rabih Zaouk, and Marc Madou "Validation of lithography based on the controlled movement of light-emitting particles", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.534355

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