Overlay measurement tool up to 70-nm design rule

Tatsuo Fukui; Hiroshi Aoki; Takeshi Endo; Tomoaki Yamada

doi:10.1117/12.535007

24 May 2004 Overlay measurement tool up to 70-nm design rule

Tatsuo Fukui, Hiroshi Aoki, Takeshi Endo, Tomoaki Yamada

Proceedings Volume 5375, Metrology, Inspection, and Process Control for Microlithography XVIII; (2004) https://doi.org/10.1117/12.535007
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

With the refined lithography techniques that exist today, it is critical for overlay measurement tools to perform with great measurement precision. Tool induced shift, TIS, is one of the key factors taken into consideration when evaluating the performance of an overlay measurement tool. TIS can be observed as a numerical value, and the measurement value is corrected by the TIS value. However, in an overlay measurement tool with TIS, the measured values could be shifted due to an interaction between TIS and a film stack structure of wafer. Therefore, it is essential to minimize the TIS values. We extend our study on the lens surface aspheric error, which is known to be one of the root causes of TIS. As this point of view, we constructed our overlay measurement tool, NRM-3100, and were able to decrease TIS values.

Citation Download Citation

Tatsuo Fukui, Hiroshi Aoki, Takeshi Endo, and Tomoaki Yamada "Overlay measurement tool up to 70-nm design rule", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); https://doi.org/10.1117/12.535007

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