Time-based PEB adjustment for optimizing CD distributions

Paul D. Friedberg; Cherry Tang; Bhanwar Singh; Thomas Brueckner; Wolfram Gruendke; Bernd Schulz; Costas J. Spanos

doi:10.1117/12.535871

24 May 2004 Time-based PEB adjustment for optimizing CD distributions

Paul D. Friedberg, Cherry Tang, Bhanwar Singh, Thomas Brueckner, Wolfram Gruendke, Bernd Schulz, Costas J. Spanos

Proceedings Volume 5375, Metrology, Inspection, and Process Control for Microlithography XVIII; (2004) https://doi.org/10.1117/12.535871
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

In this paper we investigate the impact of bake plate temperature variability throughout the entire bake trajectory on resulting critical dimension. For a poorly-controlled bake plate, it is found that the correlation between the temperature profile and CD distribution is high throughout the entire bake cycle, including the steady state sector. However, for a well-controlled, multiple-zone bake plate, the correlation is only significant during the transient heating sector, since in those cases the steady state plate behavior has already been optimized for CDU performance. An estimate of the potential improvement yet to be gained by improvement of transient heating uniformity is calculated.

Citation Download Citation

Paul D. Friedberg, Cherry Tang, Bhanwar Singh, Thomas Brueckner, Wolfram Gruendke, Bernd Schulz, and Costas J. Spanos "Time-based PEB adjustment for optimizing CD distributions", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); https://doi.org/10.1117/12.535871

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