Fast resist modeling and its application in 193nm lithography

Lei Yuan; Andrew R. Neureuther; Ebo H. Croffie

doi:10.1117/12.535564

14 May 2004 Fast resist modeling and its application in 193-nm lithography

Lei Yuan, Andrew R. Neureuther, Ebo H. Croffie

Proceedings Volume 5376, Advances in Resist Technology and Processing XXI; (2004) https://doi.org/10.1117/12.535564
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

A new resist threshold model based on image behaviors on directions parallel as well as normal to feature edges has been developed for predicting critical dimensions (CD) of two-dimension patterns. In this new model (2D-RTM), resist threshold is assumed as a second-order polynomial function of five image parameters that consist of image intensity and slope. Extensive verifications of 2D-RTM have been done by using both rigorous resist models and experimental measurements. 2D-RTM is found to be a good approximation of rigorous model within certain range of dose and defocus variation. For 130nm technology in LSI Logic, 2D-RTM improves CD prediction accuracy for typical 2D patterns to a maximum error of 3.1nm and average of 1.21nm, which gives an improvement of a factor of two compared with conventional resist threshold model.

Citation Download Citation

Lei Yuan, Andrew R. Neureuther, and Ebo H. Croffie "Fast resist modeling and its application in 193-nm lithography", Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); https://doi.org/10.1117/12.535564

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