Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental results

Gianfranco Capetti; Maddalena Bollin; Annalisa Pepe; Gina Cotti; Sara Loi; Umberto Iessi

doi:10.1117/12.533707

28 May 2004 Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental results

Gianfranco Capetti, Maddalena Bollin, Annalisa Pepe, Gina Cotti, Sara Loi, Umberto Iessi

Author Affiliations +

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.533707
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Current 90nm Flash memory design introduces imaging critical points in several devices levels: active, poly, contacts, and first metallization. Among standard Resolution Enhancement Techniques (RET), Off-axis illuminations play a fundamental role, because they are capable of providing better imaging contrast and improved process latitude in low K₁ regime with very dense structures. Starting from the simulation study of real device layer geometries, object of this work is to propose a solution in terms of illumination schemes and mask choice (binary or halftone) for each critical layer, considering K₁ around 0.35 in ArF lithography. Dedicated off-axis illuminations will be compared to standard illumination modes, underlining the benefits in terms of ultimate resolution, process window and line edge roughness improvement. Experimental data confirmed the predicted gain in process robustness and, as expected, showed great line edge roughness improvement and less marginality to pattern collapse.

Citation Download Citation

Gianfranco Capetti, Maddalena Bollin, Annalisa Pepe, Gina Cotti, Sara Loi, and Umberto Iessi "Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental results", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.533707

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available