Fast algorithm for extraction of worst-case image degradation due to flare

Scott J. Hafeman; Frank Gennari; Andrew R. Neureuther

doi:10.1117/12.535832

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28 May 2004 Fast algorithm for extraction of worst-case image degradation due to flare

Scott J. Hafeman, Frank Gennari, Andrew R. Neureuther

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Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.535832
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Unwanted scattered light affects image-quality, OPC behavior and becomes increasingly problematic with decreasing wavelength. A software system has been written that incorporates a pattern-matching algorithm to locate regions in the mask geometry that closely resemble a problematic shape. Our goal is to improve manufacturing of a full-chip layout by identifying locations worst impacted by flare. The Pattern Matcher match factor shows good agreement in predicting flare sensitivity for several flare measurement layouts. The software is able to generate and process patterns capturing short-range, mid-range and long-range flare effects.

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Scott J. Hafeman, Frank Gennari, and Andrew R. Neureuther "Fast algorithm for extraction of worst-case image degradation due to flare", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.535832

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