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28 May 2004 Fast algorithm for extraction of worst-case image degradation due to flare
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Unwanted scattered light affects image-quality, OPC behavior and becomes increasingly problematic with decreasing wavelength. A software system has been written that incorporates a pattern-matching algorithm to locate regions in the mask geometry that closely resemble a problematic shape. Our goal is to improve manufacturing of a full-chip layout by identifying locations worst impacted by flare. The Pattern Matcher match factor shows good agreement in predicting flare sensitivity for several flare measurement layouts. The software is able to generate and process patterns capturing short-range, mid-range and long-range flare effects.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Scott J. Hafeman, Frank Gennari, and Andrew R. Neureuther "Fast algorithm for extraction of worst-case image degradation due to flare", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004);

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