Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Ho-Chul Kim; Dong-Seok Nam; Gi-Sung Yeo; Suk-Joo Lee; Sang-Gyun Woo; Han-Ku Cho; Woo-Sung Han

doi:10.1117/12.533373

28 May 2004 Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Ho-Chul Kim, Dong-Seok Nam, Gi-Sung Yeo, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.533373
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Stray light is analyzed by scattering range. For the short range, stray light distributes as 1/r⁴ and comes from aberration. For the mid range and the long range, in the assumption of Gaussian distribution, characteristic scattering length of specific tools is estimated. EOR is proposed which contains information of layer geometry and scattering range characteristic of flare. To minimize CD errors from OPC, flare level and EOR should be considered in the OPC procedure.

Citation Download Citation

Ho-Chul Kim, Dong-Seok Nam, Gi-Sung Yeo, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, and Woo-Sung Han "Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.533373

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