New concepts in OPC

Nick Cobb; Yuri Granik

doi:10.1117/12.535605

28 May 2004 New concepts in OPC

Nick Cobb, Yuri Granik

Proceedings Volume 5377, Optical Microlithography XVII; (2004) https://doi.org/10.1117/12.535605
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

In this paper, we will discuss two new concepts to be used in model-based OPC: model-based fragmentation, and model tagging to account for long-range proximity effects. In model-based fragmentation we create an initial fragmentation consisting of small fragmentation across the design. Then, specific fragments are removed according to image criteria in order to keep only those fragmentation points which affect the aerial image the most. Optical flare and long-range etch effects are challenging because they have long interaction ranges. We describe here an edge tagging technique that binds different models to different regions on the layout enabling aberration- or density- sensitive corrections. We show application of this technique on a layout section. We discuss how to implement these techniques in practice and what impact they have on OPC speed and accuracy.

Citation Download Citation

Nick Cobb and Yuri Granik "New concepts in OPC", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.535605

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