Manufacturability of the X Architecture at the 90-nm technology node

Michael C. Smayling; Robin C. Sarma; Toshiyuki Nagata; Narain Arora; Michael P. Duane; Shiany Oemardani; Santosh Shah

doi:10.1117/12.536027

3 May 2004 Manufacturability of the X Architecture at the 90-nm technology node

Michael C. Smayling, Robin C. Sarma, Toshiyuki Nagata, Narain Arora, Michael P. Duane, Shiany Oemardani, Santosh Shah

Proceedings Volume 5379, Design and Process Integration for Microelectronic Manufacturing II; (2004) https://doi.org/10.1117/12.536027
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

In this paper, we discuss the results from a test chip that demonstrate the manufacturability and integration-worthiness of the X Architecture at the 90-nm technology node. We discuss how a collaborative effort between the design and chip making communities used the current generation of mask, lithography, wafer processing, inspection and metrology equipment to create 45 degree wires in typical metal pitches for the upper layers on a 90-nm device in a production environment. Cadence Design Systems created the test structure design and chip validation tools for the project. Canon’s KrF ES3 and ArF AS2 scanners were used for the lithography. Applied Materials used its interconnect fabrication technologies to produce the multilayer copper, low-k interconnect on 300-mm wafers. The results were confirmed for critical dimension and defect levels using Applied Materials’ wafer inspection and metrology systems.

Citation Download Citation

Michael C. Smayling, Robin C. Sarma, Toshiyuki Nagata, Narain Arora, Michael P. Duane, Shiany Oemardani, and Santosh Shah "Manufacturability of the X Architecture at the 90-nm technology node", Proc. SPIE 5379, Design and Process Integration for Microelectronic Manufacturing II, (3 May 2004); https://doi.org/10.1117/12.536027

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Optical proximity correction

Resistance

Manufacturing

Resistors

Semiconducting wafers

Metals

Lithography

Show All Keywords

Keywords/Phrases

Search In:

Publication Years