Lithography For A Submicron CMOS Process

P. Poppert; S. Novak; P. Wright

doi:10.1117/12.947746

23 July 1985 Lithography For A Submicron CMOS Process

P. Poppert, S. Novak, P. Wright

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947746
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

The principal requirements for a Submicron CMOS process are the ability to generate submicron geometries, and the ability to register the several masking layers closely enough to take full advantage of the benefits of those geometries. This paper discusses the suitability of a GCA 4800 Wafer stepper to fulfill those requirements.

Citation Download Citation

P. Poppert, S. Novak, and P. Wright "Lithography For A Submicron CMOS Process", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947746

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