Volume and heterogeneous chemistry in Cl2/Ar inductively coupled plasma

Alexander Efremov; Vladimir Svettsov; Chang-Il Kim

doi:10.1117/12.557001

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28 May 2004 Volume and heterogeneous chemistry in Cl₂/Ar inductively coupled plasma

Alexander Efremov, Vladimir Svettsov, Chang-Il Kim

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Proceedings Volume 5401, Micro- and Nanoelectronics 2003; (2004) https://doi.org/10.1117/12.557001
Event: Micro- and Nanoelectronics 2003, 2003, Zvenigorod, Russian Federation

Abstract

Plasma parameters and chemical kinetics of Cl₂/Ar plasma were investigated aimed at understanding the mechanism of Ar addition on mass composition of charged and neutral particles. The analysis was based on both experimental methods and plasma modeling. It was found that addition of Ar to Cl₂ leads to deformation of the electron energy distribution function and to increase of the electron mean energy. Direct electron impact dissociation of Cl₂ molecules represents the main source of chlorine atoms in plasma volume. The contributions of stepwise dissociation and ionization involving Ar metastable atoms were found to be negligible. Addition of Ar to Cl₂ causes the decrease of both electron and ion densities due to the decrease of the total ionization rate and the acceleration of heterogeneous decay of charged particles.

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Alexander Efremov, Vladimir Svettsov, and Chang-Il Kim "Volume and heterogeneous chemistry in Cl₂/Ar inductively coupled plasma", Proc. SPIE 5401, Micro- and Nanoelectronics 2003, (28 May 2004); https://doi.org/10.1117/12.557001

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