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20 August 2004 Improvement of unified mask data formats for EB writers
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Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557738
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan
Abstract
Mask data preparation (MDP) is a complicated process because many kinds of EB data files and jobdeck data files are used in mask manufacturers and EB data files continue to become bigger. Therefore we have developed unified mask data formats for Variable-Shaped-Beam (VSB) EB writers with efficient data compaction. The unified mask data formats are composed of a pattern data format for EB writers named "NEO" and a layout format named "MALY". We released NEO and MALY on April 2003. To evaluate NEO and MALY, we have made a prototype system of MDP such as a converter from design data to NEO/MALY and converters from NEO/MALY to each EB data. We have evaluated about functions and performance of the MDP flow using real design data in device manufacturers. As a result, some improvements in NEO and MALY were achieved and we have revised the specification of NEO and MALY as the final version. We have confirmed that NEO and MALY can be used for a set of unified mask data formats among VSB EB writers and can reduce complexity of mask data handling in mask manufacturers. They will be put to practical use in MDP flow.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojyo, Yuichi Kawase, Shigehiro Hara, Koki Kuriyama, Morihisa Hoga, Satoshi W. Watanabe, Hidemichi Kawase, Tomoko Kamimoto, and Kokoro Kato "Improvement of unified mask data formats for EB writers", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557738
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