Translator Disclaimer
20 August 2004 Progressive architecture of mask supply chain and integrated operation system supporting extreme-QTAT device manufacturing
Author Affiliations +
Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004)
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan
In recent years, Quick-TAT (Turn-Around Time) in preparing masks is very important factor together with the complexity and cost in mask development and manufacturing in higher-end devices. Especially in the development phase of customer-driven devices such as SOC, MCU and so on, QTAT role of mask supply might get a larger weight in LSI business. However, overhead in workflow, system and burden of mask users (designer, etc) in mask making are significant, not to mention the increase of OPC processing time and DA cost. For responding to the efficient and precipitous manufacturing requirement even for complicated leading-edge devices, we should focus on the optimization of workflow system minimization of mask-work resources in users (designer, etc.). Therefore, new Renesas Integrated Mask Operation System (RIMOS) has been developed as making masks “Everywhen you want” supporting five key functions as follows: (1) Simple interface to input mask-making parameters on Web-based integrated system (2) Hierarchical specification system of high maintainability and capability for SEMI-P10 format (3) Easy operation to instruct build-in specification for manufacturing such as complicated CD inspection (4) Bi-directional synchronization between mask-shop and wafer-fabs MES supporting the flexible multi-pass supply of masks (5) On-line quality reporting for mask-SPC monitoring supporting. This paper shows architecture of the new system 'RIMOS' and the estimate of TAT reduction in workflow.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masayoshi Mori, Isao Miyazaki, Ken Fujimoto, and Kunihiro Hosono "Progressive architecture of mask supply chain and integrated operation system supporting extreme-QTAT device manufacturing", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004);


Mask cost and cycle time reduction
Proceedings of SPIE (August 28 2003)
Monitoring strategy to match the advanced fabs
Proceedings of SPIE (June 02 2004)
PMJ' 99 panel discussion review OPC mask technology for...
Proceedings of SPIE (December 30 1999)
Mask manufacturability improvement by MRC
Proceedings of SPIE (October 30 2007)

Back to Top