Comparison of growth rate, roughness, and surface morphology of Cu and W thin films prepared by pulsed laser deposition

Miroslav Michalka; Frantisek Uherek; Jaroslav Bruncko

doi:10.1117/12.563095

21 June 2004 Comparison of growth rate, roughness, and surface morphology of Cu and W thin films prepared by pulsed laser deposition

Miroslav Michalka, Frantisek Uherek, Jaroslav Bruncko

Author Affiliations +

Proceedings Volume 5449, Eighth International Conference on Laser and Laser Information Technologies; (2004) https://doi.org/10.1117/12.563095
Event: Eighth International Conference on Laser and Laser Information Technologies, 2003, Smolyan, Bulgaria

Abstract

The aim of this study was to compare some differences between the growth rate, roughness and surface morphology of Cu and W layers. The growth of metal thin films was performed on silicon substrate. The layers were prepared by the pulsed laser deposition (PLD) using THG Nd:YAG laser at 355 nm. The number of laser pulses (time of deposition) varied from 1000 to 20000. The characteristics of the layers were examined using the methods of atomic force microscopy (AFM) and scanning electron microscopy (SEM). Results show that the growth rate of W is higher than Cu.

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Miroslav Michalka, Frantisek Uherek, and Jaroslav Bruncko "Comparison of growth rate, roughness, and surface morphology of Cu and W thin films prepared by pulsed laser deposition", Proc. SPIE 5449, Eighth International Conference on Laser and Laser Information Technologies, (21 June 2004); https://doi.org/10.1117/12.563095

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