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8 September 2004 Basic aspects of deep lithography with particles for the fabrication of micro-optical and micromechanical structures
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Abstract
The strength of today's deep lithographic micro-machining technologies is their ability to fabricate monolithic building-blocks including optical and mechanical functionalities that can be precisely integrated in more complex photonic systems. In this contribution we present the physical aspects of Deep Lithography with ion Particles (DLP). We investigate the impact of the ion mass, energy and fluence on the developed surface profile to find the optimized irradiation conditions for different types of high aspect ratio micro-optical structures. To this aim, we develop a software program that combines the atomic interaction effects with the macroscopic beam specifications. We illustrate the correctness of our simulations with experimental data that we obtained in a collaboration established between the accelerator facilities at TUM, LNS and VUB. Finally, we review our findings and discuss the strengths and weaknesses of DLP with respect to Deep Lithography with X-rays (LIGA).
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bart Volckaerts, Pedro Vynck, Michael Vervaeke, Luigi Cosentino, Paolo Finocchiaro, Patrick Reichart, Gerd Datzmann, Andreas Hauptner, Gunther Dollinger, Alex Hermanne, and Hugo Thienpont "Basic aspects of deep lithography with particles for the fabrication of micro-optical and micromechanical structures", Proc. SPIE 5454, Micro-Optics: Fabrication, Packaging, and Integration, (8 September 2004); https://doi.org/10.1117/12.547718
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