An in situ test structure for simultaneously determining multimaterial properties of a film

Chi Hsiang Pan

doi:10.1117/12.545231

16 August 2004 An in situ test structure for simultaneously determining multimaterial properties of a film

Chi Hsiang Pan

Author Affiliations +

Proceedings Volume 5455, MEMS, MOEMS, and Micromachining; (2004) https://doi.org/10.1117/12.545231
Event: Photonics Europe, 2004, Strasbourg, France

Abstract

We present a set of in-situ test structures for simultaneously determining residual stress (RS), Young's modulus (YM) and thermal expansion coefficient (TEC) of a film. Analytical models as functions of the displacement, geometry and material property of the test structures are theoretically derived for the task of extracting the film properties. This method utilizes available measurement apparatus and all the properties are identified and quantified on the same apparatus. The test structures consist of the measured film and the calibration film and are fabricated by a simple sacrificial-layer micromachining technique. The measured films made of undoped LPCVD polycrystalline silicon and the calibration film made of PECVD silicon nitride are used to demonstrate the effectiveness of the proposed method. The average calibrated residual stresses of undoped polysilicon films with deposition temperatures of 600°C and 620°C are 105± 5MPa and 240 ± 10MPa, respectively, and the corresponding Young's moduli are 170± 5GPa and 150 ± 5GPa. But the thermal expansion coefficient is approximately 2.7x 10^-6 average.

Citation Download Citation

Chi Hsiang Pan "An in situ test structure for simultaneously determining multimaterial properties of a film", Proc. SPIE 5455, MEMS, MOEMS, and Micromachining, (16 August 2004); https://doi.org/10.1117/12.545231

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