Paper
18 October 2004 Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement
Satoshi Matsuyama, Hidekazu Mimura, Kazuya Yamamura, Hirokatsu Yumoto, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Kenji Tamasaku, Yoshinori Nishino, Tetsuya Ishikawa, Kazuto Yamauchi
Author Affiliations +
Abstract
The spatial resolution of the scanning X-ray microscopy apparently depends on the beam size of the focused X-ray. Recently, highly accurate elliptical mirrors were reported to be fabricated, and nearly diffraction-limited line focusing was achieved. In this study, to realize diffraction-limited and 2-dimentional focusing with such highly accurate mirrors, accuracies to be realized in mirror alignings, for example, adjusting the glancing angle and the in-plane rotation, were estimated by employing two types of simulators. They are appropriately based on geometrical or wave-optical theories. They are alternatively employed according to the degree of accuracy required in the mirror alignment. A focusing unit with the adjusting mechanism fulfilling the required alignment accuracies was constructed, and the relationships between the alignment errors and focused beam profiles were quantitatively examined at the 1km-long beamline (BL29XUL) of SPring-8. Obtained results were in good agreement with the calculated results. Additionally, the alignment accuracy to be realized in the K-B unit equipping mirrors of larger NA (numerical aperture) was calculated to realize sufficient performances in focusing.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Satoshi Matsuyama, Hidekazu Mimura, Kazuya Yamamura, Hirokatsu Yumoto, Yasuhisa Sano, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Kenji Tamasaku, Yoshinori Nishino, Tetsuya Ishikawa, and Kazuto Yamauchi "Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement", Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); https://doi.org/10.1117/12.567515
Lens.org Logo
CITATIONS
Cited by 4 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Mirrors

X-rays

Hard x-rays

Optical alignment

X-ray optics

Optical simulations

X-ray microscopy

RELATED CONTENT


Back to Top