Present state of the art in undulator technology

Steve C. Gottschalk

doi:10.1117/12.560076

10 November 2004 Present state of the art in undulator technology

Steve C. Gottschalk

Proceedings Volume 5534, Fourth Generation X-Ray Sources and Optics II; (2004) https://doi.org/10.1117/12.560076
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

We summarize the technology status of undulators suitable for Vacuum Ultraviolet (VUV) sources. Planar, biharmonic, multi-harmonic and elliptically polarized undulator designs and performance will be reviewed. The present state of the art in virtual prototyping, manufacturing and tuning will also be discussed.

Citation Download Citation

Steve C. Gottschalk "Present state of the art in undulator technology", Proc. SPIE 5534, Fourth Generation X-Ray Sources and Optics II, (10 November 2004); https://doi.org/10.1117/12.560076

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