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4 November 2004 Tantalum zone plates for scanning x-ray microscopy between 0.5 and 2.5 keV
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Abstract
In the framework of TWINMIC, a project for the development of a multipurpose compact X-ray microscopy station capable of both scanning and full-field imaging, fabrication methods for tantalum zone plates are being developed at the Laboratory for Micro- and Nanotechnology of the Paul Scherrer Institut. Tantalum is deposited on supporting silicon or silicon nitride membranes by magnetron sputtering. The zone-plate patterns are transferred into the tantalum layer by reactive ion etching. Electron-beam lithography with continuous path control using a Leica LION LV1 e-beam machine has been used to make zone plates with diameters between 250 and 500 μm and thicknesses between 200 and 300 nm, all with an outermost zone width of 80 nm.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Timm Weitkamp, Olivier Dhez, Burkhard Kaulich, and Christian David "Tantalum zone plates for scanning x-ray microscopy between 0.5 and 2.5 keV", Proc. SPIE 5539, Design and Microfabrication of Novel X-Ray Optics II, (4 November 2004); https://doi.org/10.1117/12.559704
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