Aerial-image-based inspection on subresolution scattering bars

Luke T.H. Hsu; C. C. Lin; Anja Rosenbusch; Yuval Bloomberg; Simon Kurin

doi:10.1117/12.579749

6 December 2004 Aerial-image-based inspection on subresolution scattering bars

Luke T.H. Hsu, C. C. Lin, Anja Rosenbusch, Yuval Bloomberg, Simon Kurin

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Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.579749
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

The paper presents the results of a study to define a production-worthy inspection technique for subresolution solid and hollow scattering features used in 193-nm lithography. Masks are inspected using conventional high-NA and aerial-imaging-based mask inspection tools. Inspection results are compared regarding capture rate and nuisance defect rate.

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Luke T.H. Hsu, C. C. Lin, Anja Rosenbusch, Yuval Bloomberg, and Simon Kurin "Aerial-image-based inspection on subresolution scattering bars", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.579749

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