Conformal mapping in microlithography

Asher Klatchko; Peter Pirogovsky

doi:10.1117/12.561106

6 December 2004 Conformal mapping in microlithography

Asher Klatchko, Peter Pirogovsky

Author Affiliations +

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.561106
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

We show that a conformal mapping of the type, W = z π/α, describes how a shape of a 45° rotated cross transforms into a contact hole. We discuss its relevance to corner rounding seen on raster beam pattern generators.

Citation Download Citation

Asher Klatchko and Peter Pirogovsky "Conformal mapping in microlithography", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.561106

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