E-beam mask repair: fundamental capability and applications

Ted Liang; Eric Frendberg; Daniel J. Bald; Michael Penn; Alan R. Stivers

doi:10.1117/12.569210

6 December 2004 E-beam mask repair: fundamental capability and applications

Ted Liang, Eric Frendberg, Daniel J. Bald, Michael Penn, Alan R. Stivers

Author Affiliations +

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569210
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

We have installed the industry's first commercial electron beam mask repair tool in Intel's mask shop. In this paper we describe our on-going efforts of developing e-beam repair processes for binary, phase-shifting and EUVL masks. We present a complete characterization of fundamental capabilities of e-beam repair and make general comparisons with other technologies, in terms of repair resolutions, substrate damage, edge placement, removal selectivity, and process margin. Among many applications, results from quartz etch with excellent resolution and vertical profile are described.

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Ted Liang, Eric Frendberg, Daniel J. Bald, Michael Penn, and Alan R. Stivers "E-beam mask repair: fundamental capability and applications", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569210

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