Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

Dong Wook Lee; Ho Yong Jung; Mun Sik Kim; Jun Sik Lee; Yong Kyoo Choi; Oscar Han

doi:10.1117/12.569015

6 December 2004 Effect of UV/O₃ treatment on mask surface to reducing sulfuric residue ions

Dong Wook Lee, Ho Yong Jung, Mun Sik Kim, Jun Sik Lee, Yong Kyoo Choi, Oscar Han

Author Affiliations +

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569015
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

The critical source of haze contamination which mainly occurred on MoSiN surface and the interface of MoSiN and quartz is known as sulfuric ions remained after mask process. In this experiment, the UV treatment with oxygen gas was carried out before and after wet cleaning process for reducing residue ions from mask surface, and the effect with the sequence of UV treatment and wet cleaning was investigated. The composition of amorphous MoSiN layer was slightly modified by 172nm UV treatment with oxygen gas, and the amount of chemical residue ions after wet cleaning which use the piranha and SC-1 was reduced according to the transformation of surface composite. And also the relation of the surface transformation and the phase shift after SC-1 cleaning was evaluated.

Citation Download Citation

Dong Wook Lee, Ho Yong Jung, Mun Sik Kim, Jun Sik Lee, Yong Kyoo Choi, and Oscar Han "Effect of UV/O₃ treatment on mask surface to reducing sulfuric residue ions", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569015

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