Immersion mask inspection with hybrid-microscopic systems at 193 nm

Robert Brunner; Alexander Menck; Reinhard Steiner; Gerd Buchda; Steffen Weissenberg; Uwe Horn; Axel M. Zibold

doi:10.1117/12.569019

6 December 2004 Immersion mask inspection with hybrid-microscopic systems at 193 nm

Robert Brunner, Alexander Menck, Reinhard Steiner, Gerd Buchda, Steffen Weissenberg, Uwe Horn, Axel M. Zibold

Author Affiliations +

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569019
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

The capability of a high NA, large working distance, microscope objective was demonstrated by investigating different mask features. The microscope objective is based on a hybrid concept combining diffractive and refractive optical elements. Resolution down to 125 nm lines and spaces (L/S) is demonstrated by investigating periodic chrome on glass structures. A significant additional improvement of the resolution is achieved by inducing a solid immersion lens (SIL).

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Robert Brunner, Alexander Menck, Reinhard Steiner, Gerd Buchda, Steffen Weissenberg, Uwe Horn, and Axel M. Zibold "Immersion mask inspection with hybrid-microscopic systems at 193 nm", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569019

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