Mask defect inspection study with high-speed mask inspection system

Jeayoung Jun; Hyunchul Kim; Sungjin Choi; Yong Kyoo Choi; Oscar Han

doi:10.1117/12.569226

6 December 2004 Mask defect inspection study with high-speed mask inspection system

Jeayoung Jun, Hyunchul Kim, Sungjin Choi, Yong Kyoo Choi, Oscar Han

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569226
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

In this study, A new inspection system with Nd:YAG laser beam has been developed to detect defects on blank mask and particles from process and handling. The development of new reflective image and optic system increased inspection speed for advanced Cr, PSM and Quartz substrate. Through easy operation and defect classification, the productivity of inspection and particle control on mask process was increased. With this new inspection system, defects on blank mask was classified and evaluated after patterning process. As a process monitoring tool, defects from all mask process equipments have been evaluated and monitored with different microscopy and metrology tools to identify and characterize them on various steps. Our results demonstrate that this process monitoring is very effective to identify defects and their sources, and to prevent mask reject caused by defect of each process.

Citation Download Citation

Jeayoung Jun, Hyunchul Kim, Sungjin Choi, Yong Kyoo Choi, and Oscar Han "Mask defect inspection study with high-speed mask inspection system", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569226

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