Mask defect reduction through automated pellicle mounting

Richard E. Wistrom; Dennis Hayden; Timothy Neary

doi:10.1117/12.569061

6 December 2004 Mask defect reduction through automated pellicle mounting

Richard E. Wistrom, Dennis Hayden, Timothy Neary

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Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569061
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

At IBM’s Mask House, we deigned, installed, and evaluated a fully automated pellicle mounting tool. Features include very low particulate levels, ability to mount a wide variety of pellicles, ease of operation, and pellicle and mask inspection capability. During an evaluation period, pellicles were mounted both with this fully automated tool and with a semiautomatic tool. The fully automated tool showed good reliability (>95% availability) and a 2X lower incidence of foreign material contemination as compared with the semiautomatic tool.

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Richard E. Wistrom, Dennis Hayden, and Timothy Neary "Mask defect reduction through automated pellicle mounting", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569061

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