Rasterizing for SLM-based mask making and maskless lithography

Hans Martinsson; Tor Sandstrom

doi:10.1117/12.569277

6 December 2004 Rasterizing for SLM-based mask making and maskless lithography

Hans Martinsson, Tor Sandstrom

Author Affiliations +

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569277
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

In high fidelity SLM-based mask making and maskless lithography, a high performance rasterizer with high capability is of utmost importance. The rasterizer must be capable, not only to convert the vector format input data to a bitmap suitable for the SLM in fractions of seconds, but also to perform image adjustments in terms of edge placement and edge acuity. This paper presents a new rasterizing algorithm with built-in capability to remove virtually all influence of the finite pixel size on lithographic performance, even for printed features down to the size less than 2 pixels. The rasterizer allows the SLM to mimic the performance of any phase-shifted reticle, including strong phase-shifting and chromeless lithography. In addition, with SLM-based mask making and maskless lithography, it is possible to switch between completely different printing modes (binary, weak and strong phase-shifting, or CPL) between consecutive exposures, without the need for reticle and wafer re-alignment. The result is improved image fidelity, smaller printed features relative to the pixel grid, and flexible powerful phase-shifting capabilities.

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Hans Martinsson and Tor Sandstrom "Rasterizing for SLM-based mask making and maskless lithography", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569277

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