Updates on the coefficient of thermal expansion property and surface finish capability of CLEARCERAM-Z series for EUVL photomask substrate application

Kousuke Nakajima; Toshihide Nakajima

doi:10.1117/12.569009

6 December 2004 Updates on the coefficient of thermal expansion property and surface finish capability of CLEARCERAM®-Z series for EUVL photomask substrate application

Kousuke Nakajima, Toshihide Nakajima

Author Affiliations +

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569009
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

CLEARCERAM®-Z HS is a low thermal expansion glass-ceramics and has been used in semiconductor industry field as well as for various precision applications. Extreme Ultra Violet Lithography (EUVL) is one of the applications, in which future utilization of CLEARCERAM®-Z HS can be expected. Previous reports revealed that CLEARCERAM®-Z HS met the material requirements in the SEMI spec. This paper refers to the latest investigation results on the CTE & surface finish performance of CLEARCERAM®-Z HS relative to the SEMI spec. Also the data obtained from the development of new CLEARCERAM®-Z, which is designed for more fit with EUVL applications, will be presented and its advantageous potential for EUVL Photomask substrate application is to be discussed.

Citation Download Citation

Kousuke Nakajima and Toshihide Nakajima "Updates on the coefficient of thermal expansion property and surface finish capability of CLEARCERAM®-Z series for EUVL photomask substrate application", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569009

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