Laser direct write patterned indium tin oxide films for photomasks and anisotropic resist applications

Jun Peng; Glenn H. Chapman; Yuqiang Tu

doi:10.1117/12.567642

9 December 2004 Laser direct write patterned indium tin oxide films for photomasks and anisotropic resist applications

Jun Peng, Glenn H. Chapman, Yuqiang Tu

Proceedings Volume 5578, Photonics North 2004: Photonic Applications in Astronomy, Biomedicine, Imaging, Materials Processing, and Education; (2004) https://doi.org/10.1117/12.567642
Event: Photonics North, 2004, Ottawa, Ontario, Canada

Abstract

A laser direct write process has been developed for turning patterned bimetallic Sn/In film into a indium tin oxide layer. Sn over In films (15-120nm thick) with a 1:10 thickness ratio were deposited by DC sputtering. An argon laser beam (0.1 - 0.9 W, spot size: 2 micron, scan speed: 1 cm/s) exposes the film into patterns. These Sn/In films' optical absorption changed from 3 OD at deposition to 0.24 OD after exposure (at 356 nm). XRD, SEM, EDX, and Auger have been used to investigate the film's microstructure and composition suggesting ITO like characteristics. XRD indicated a preferred In₂O₃ (222) orientation which is similar to ITO films deposited by other methods. Four-point probe tests showed a converted film resistivity of 0.26x10^-3 to 9.7x10^-3 ohm-cm depending on the laser power and Sn concentration. Hall tests indicated that the bulk carrier concentration was in the range of 10¹⁸ to 10²⁰ cm^-3. Developed in a wet HCl: H₂O₂: H₂O =1:1:48 solution removes unexposed Sn/In leaving patterned ITO films created at much lower laser power levels than needed for ablative patterning of ITO. Developed films are also resistant to KOH anisotropic etching at a 1:700 ratio producing <111> trenches in Si (100). The large change in optical density means Sn/In films can be used as a material of the direct write photomasks.

Citation Download Citation

Jun Peng, Glenn H. Chapman, and Yuqiang Tu "Laser direct write patterned indium tin oxide films for photomasks and anisotropic resist applications", Proc. SPIE 5578, Photonics North 2004: Photonic Applications in Astronomy, Biomedicine, Imaging, Materials Processing, and Education, (9 December 2004); https://doi.org/10.1117/12.567642

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