Integrated micromachined filters for wavelength division multiplexing

Keith L. Lewis; Gilbert W. Smith; Mark E. McNie

doi:10.1117/12.578554

Translator Disclaimer

30 November 2004 Integrated micromachined filters for wavelength division multiplexing

Keith L. Lewis, Gilbert W. Smith, Mark E. McNie

Author Affiliations +

Proceedings Volume 5618, Integrated Optical Devices, Nanostructures, and Displays; (2004) https://doi.org/10.1117/12.578554
Event: European Symposium on Optics and Photonics for Defence and Security, 2004, London, United Kingdom

Abstract

Using deep-dry etching techniques it is possible to realise filters for use in optical telecommunication based on silicon/air cavities with a high degree of finesse, and which are oriented substantially perpendicular to the surface of the silicon substrate. This geometry is well suited to their incorporation in hollow-waveguides or within ridge waveguide structures. The optical characteristics of such devices are determined by a number of factors, including the designs of the optical cavities and the degree of surface perfection achievable by the deep-dry etching process.

Citation Download Citation

Keith L. Lewis, Gilbert W. Smith, and Mark E. McNie "Integrated micromachined filters for wavelength division multiplexing", Proc. SPIE 5618, Integrated Optical Devices, Nanostructures, and Displays, (30 November 2004); https://doi.org/10.1117/12.578554

ACCESS THE FULL ARTICLE