Titanium dioxide thin films: refractive index variation as a function of the deposition rate

G. Galvez; Guillermo Baldwin-Olguin; Francisco Villa

doi:10.1117/12.590925

21 October 2004 Titanium dioxide thin films: refractive index variation as a function of the deposition rate

G. Galvez, Guillermo Baldwin-Olguin, Francisco Villa

Proceedings Volume 5622, 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications; (2004) https://doi.org/10.1117/12.590925
Event: 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications, 2004, Porlamar, Venezuela

Abstract

The present work studies the variation of refractive index of titanium dioxide thin films due to changes in the evaporation rate during the deposition process under high vacuum. The experiments were done by depositing thin films on a glass disk of 45 cm in diameter for different deposition rates. To characterize thin films the spectral transmittance in the visible range was measured at different points along of two perpendicular radii. The refractive index profile was then determined from these data by using an inverse synthesis method. The results permitted us to obtain the refractive index variation as a function of evaporation geometry for different deposition rates.

Citation Download Citation

G. Galvez, Guillermo Baldwin-Olguin, and Francisco Villa "Titanium dioxide thin films: refractive index variation as a function of the deposition rate", Proc. SPIE 5622, 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications, (21 October 2004); https://doi.org/10.1117/12.590925

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