Influence of preparation technique on the microscopic structure and surface morphology of nanometer TiO<sub>2</sub> thin films

Xiaoyun Hu; Jun Fan; Ting Li; Dekai Zhang; Jintao Bai; Xun Hou

doi:10.1117/12.575510

9 February 2005 Influence of preparation technique on the microscopic structure and surface morphology of nanometer TiO₂ thin films

Xiaoyun Hu, Jun Fan, Ting Li, Dekai Zhang, Jintao Bai, Xun Hou

Author Affiliations +

Proceedings Volume 5635, Nanophotonics, Nanostructure, and Nanometrology; (2005) https://doi.org/10.1117/12.575510
Event: Photonics Asia, 2004, Beijing, China

Abstract

Nanometer TiO₂ thin films are prepared by a sol-gel method and the effects of preparation technique on the microstructure and surface morphology of the obtained materials are studied using X-ray Diffraction [XRD,IR spectrum[IR], UV-VIS spectrum [UV-VIS,AFM and X-ray photoelectron spectroscopy[XPS]. The results show that the TiO₂ thin films are of anatase and rutile phase structures when annealed in a temperature range from 450°C to 600°C. When heated up to 700°C, the structure of TiO₂ film changed into rutile completely. In the TiO₂ thin films, there is some residual carbon from the starting organometallic components and a small amount of sodium ions diffused from the glass substrates. During heat-treatment, the absorption peak of water become weak gradually and the organic groups are disappeared completely at 500°C. Optimum film layers are obtained for the UV absorbance index. AFM result shows that the rough morphology of surface [RMS] of films is about 2-3nm or so.

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Xiaoyun Hu, Jun Fan, Ting Li, Dekai Zhang, Jintao Bai, and Xun Hou "Influence of preparation technique on the microscopic structure and surface morphology of nanometer TiO₂ thin films", Proc. SPIE 5635, Nanophotonics, Nanostructure, and Nanometrology, (9 February 2005); https://doi.org/10.1117/12.575510

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